A team of boffins lead by Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has unveiled a groundbreaking and significantly simplified EUV lithography tool, poised ...

SANTA CLARA, Calif. — In a rare glimpse into its future chip-equipment strategy, Intel Corp. here today disclosed that it has ordered the world's first extreme ultraviolet (EUV) lithography tool from ...

For IC design at the 90- and 65-nm process nodes to be truly successful, the design process needs more predictability built into it in terms of yield. The problem, to a large extent, is that there has ...

Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...

Austin, Texas and Oxford, England (7 July 2004) -- International SEMATECH and Exitech have announced an agreement to develop the world’s first ultra high numerical aperture (NA = 1.3) 193 nm ...

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

TOKYO--(BUSINESS WIRE)--USHIO INC. (TOKYO:6925) (President and CEO: Shiro Sugata) today announced that at SEMICON West 2014 (Booth #2105) the company will exhibit a series of its lithography tools for ...

PORTLAND, Ore. — A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography. Putting a layer of water between a wafer and the stepper lens could ...

Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

Semiconductor equipment maker ASML Holding this week delivered what it says is the first 157-nanometer lithography machine to the Interuniversities MicroElectronic Center (IMEC), a European ...